argreen Process Technologies | From Coarse Straining Down to Microfiltration, Reverse Osmosis and Ultra Filtration
Pargreen Process Technologies
1224 Capitol Drive
Addison, IL. 60101
USA

Call: 800.323.2810
Fax: 630.628.3050
Email: sales@pargreen.com
Website: www.pargreen.com
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Chemically-resistant cartridge for ultrapure microelectronics fluids and gases

The Proflow™ II-E filter cartridge uses a PTFE membrane along with high purity polypropylene supports that provide an economical alternative to all-fluoropolymer cartridges. It provides a high degree of retention and cleanliness along with good flow and lifetime. This filter is ideally suited for ultrapure microelectronics fluids and gases. The hydrophobic PTFE membrane serves as a highly efficient barrier to insure low moisture content of gases. It is available dry or wet packed for quick installation and lower extractables.
Unit of Measure

Specifications

Filter Rating

 N/A 0.03 µm0.05 µm0.10 µm0.2 µm0.45 µm1 µm

Treatment Application

 N/A Standard

Insert Style

 N/A No Insert

End Fittings

 N/A DOE (CUNO®)

Nominal Length

 N/A 5 in130 mm

Gasket/O-Ring Material

 N/A Buna N EPDM FEP-Encapsulated Silicone (O-Rings only) FEP-Encapsulated Viton (O-Rings only) None Silicone Viton®

Thickness (Gaskets only)

 N/A 0.125" (3 mm) 0.200" (5 mm) (1) 0.200" (5 mm) & (1) 0.125" (3 mm) No Gasket

Treatment Options

 N/A Standard Wet Packed

Effective Filtration Area per 5 inch (130 mm) Cartridge

 N/A 4.6 ft²0.43 m²

Effective Filtration Area per 10 inch (250 mm) Cartridge

 N/A 9.3 ft²0.86 m²

Maximum Forward Differential Pressure/Temperature @ 75ºF (24ºC)

 N/A 80 psid5.5 bar

Maximum Forward Differential Pressure/Temperature @ 180ºF (82ºC)

 N/A 40 psid2.8 bar

Maximum Reverse Differential Pressure/Temperature @ 75ºF (24ºC)

 N/A 50 psid3.4 bar

Cleanliness (Particle Shedding)

 N/A Wet-packed: < 1 particles/ml > 0.2µm after 6gal at 1gpm
Data as from open bag and installed, no additional installation flushing.
Typical Water Flow Rates1 N/A 0.03 µm - 0.6 gpm/psid (3.31 lpm/100 mbar) 0.05 µm - 0.8 gpm/psid (4.39 lpm/100 mbar) 0.10 µm - 1 .7 gpm/psid (9.33 lpm/100 mbar) 0.20 µm - 3.2 gpm/psid (17.5 lpm/100 mbar) 0.45 µm - 7.6 gpm/psid (41.72 lpm/100 mbar) 1.00 µm - 9.1 gpm/psid (49.97 lpm/100 mbar)

Materials of Construction

Membrane

 N/A PTFE

Support Layers

 N/A Polypropylene

Structure

 N/A Polypropylene

TOC/Resistivity Rinse-Up (Wet-Packed)

N/A TOC rinse-up to background plus 5ppb of feed after 70gal @ 1gpm. Resistivity rinse-up to background minus 0.2megohm-cm of feed after 30gal @ 1gpm..

Benefits

N/A

  • Good liquid and gas flow rates
  • Wet-pack option for quick installation
  • PTFE/PP construction for chemical resistance
  • Wide variety of configurations and ratings
  • 100% integrity tested in clean room environment

    • Applications

    N/A

    • Bulk chemical delivery
      - Acids, bases, solvents, photochemicals
    • Wet etch and clean
      - Dilute acids
      - DI water(< 80°C)
    • Ultrapure electronics-grade gases

    Technical Support and Product Information

    N/A Parker Hannifin Corporation provides our customers with unsurpassed product consistency and cost-efficiency. Our experienced professionals can help you select the right solution for your application. For more information or to place an order, contact your local distributor. Information on product specifications, applications and chemical compatibility can be found on our web site at www.parker.com or through your nearest Parker Hannifin Corporation office.

    Parker Hannifin Corporation designs and manufactures an extensive line of innovative solutions for specific applications in the Microelectronics, Biopharmaceutical, Food and Beverage, Industrial and Chemical industries.

    Note

    N/A Specifications are subject to change without notification.
    Proflow is a registered trademark of Parker Hannifin Corporation.
    Viton is a registered trademark of E.I. DuPont de Nemours & Co., Inc.
    Cuno is a registered trademark of Cuno Inc.

    • 1 Per 10-inch (250mm) cartridge equivalent.