Pargreen Process Technologies - Polyflow® Membrane Cartridges

Polypropylene membrane cartridges for microelectronics

Polyflow® Membrane cartridges are optimized for use in microelectronics applications such as bulk chemicals and photoresists. The all-polypropylene construction is an economical alternative to fluoropolymer-based cartridges.

Every cartridge is fabricated in a clean room environment, pre-flushed with 18 megohm-cm ultrapure DI water, and 100% integrity tested in an ISO-certified facility.

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Unit of Measure

Items	24-10010-924 Polyflow® Membrane Cartridges	24-10010-001 Polyflow® Membrane Cartridges	24-10010-002 Polyflow® Membrane Cartridges	24-10010-101 Polyflow® Membrane Cartridges	24-10020-924 Polyflow® Membrane Cartridges
Filter Rating	N/A 0.04 µm	N/A 0.10 µm	N/A 0.2 µm	N/A 0.07 µm	N/A 0.04 µm
Insert Style	N/A No Insert (Standard)
End Fittings	N/A DOE (CUNO®)
Nominal Length	N/A 10 in250 mm	N/A 10 in250 mm	N/A 10 in250 mm	N/A 10 in250 mm	N/A 20 in500 mm
Gasket/O-Ring Material	N/A Buna N EPDM FEP-Encapsulated Viton (O-Rings only) None Silicone Viton®
Thickness (Gaskets only)	N/A 0.125" (3 mm) 0.200" (5 mm) (1) 0.200" (5 mm) & (1) 0.125" (3 mm) None
Treatment Options	N/A Standard Wet Packed
Membrane	N/A Polypropylene
Support Layers	N/A Polypropylene
Structure	N/A Polypropylene
Effective Filtration Area per 10 inch (250 mm) Cartridge¹	N/A 7.7 ft²0.72 m²	N/A 7.7 ft²0.72 m²	N/A 7.7 ft²0.72 m²	N/A 6.6 ft²0.61 m²	N/A 7.7 ft²0.72 m²
Metals Extractables²	N/A < 50ppb (total)
Maximum Forward Differential Pressure/Temperature @ 75ºF (24ºC)	N/A 80 psid5.5 bar
Maximum Forward Differential Pressure/Temperature @ 180ºF (82ºC)	N/A 40 psid2.8 bar
Maximum Reverse Differential Pressure/Temperature @ 75ºF (24ºC)	N/A 60 psid4.1 bar	N/A 40 psid2.8 bar	N/A 40 psid2.8 bar	N/A 40 psid2.8 bar	N/A 60 psid4.1 bar
Cleanliness (Particle Shedding)	N/A Wet-packed < 1 particles/ml > 0.2µm after 10gal at 1gpm Data as from open bag and installed, no additional installation flushing.
TOC/Resistivity Rinse-Up (Wet-Packed)	N/A TOC rinse-up to background plus 5ppb of feed after 40gal @ 1gpm. Resistivity rinse-up to background minus 0.2megohm-cm of feed after 40gal @1gpm.
Typical Water Flow Rates³	N/A 0.41 gpm/psid2.2 lpm/100 mbar	N/A 0.7 gpm/psid3.8 lpm/100 mbar	N/A 1.8 gpm/psid10.3 lpm/100 mbar	N/A 0.35 gpm/psid1.9 lpm/100 mbar	N/A 0.41 gpm/psid2.2 lpm/100 mbar
Benefits	N/A High-retention membrane Wide range of configurations and ratings 100% integrity tested
Applications	N/A Bulk photoresist Bulk electronics grade chemicals
Technical Support and Product Information	N/A Parker Hannifin Corporation provides our customers with unsurpassed product consistency and cost-efficiency. Our experienced professionals can help you select the right solution for your application. For more information or to place an order, contact your local distributor. Information on product specifications, applications and chemical compatibility can be found on our web site at www.parker.com or through your nearest Parker Hannifin Corporation office. Parker Hannifin Corporation designs and manufactures an extensive line of innovative solutions for specific applications in the Microelectronics, Biopharmaceutical, Food and Beverage, Industrial and Chemical industries.
Note	N/A Specifications are subject to change without notification. Polyflow is a registered trademark of Parker Hannifin Corporation. Viton is a registered trademarks of E.I. DuPont de Nemours & Co., Inc. Cuno is a registered trademarks of Cuno, Inc.
¹ Double layers of membrane ² in a 10% HNO₃ extraction ³ Per 10-inch (250 mm) cartridge equivalent.